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微电子设备用耐熔硅化物溅射电极的标准规范
Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications
参考页数：3P.;A4
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薄膜设备用铬溅射极的标准规范
Standard Specification for Chromium Sputtering Targets for Thin Film Applications
参考页数：2P.;A4
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薄膜设备用铬溅射极的标准规范
Standard Specification for Chromium Sputtering Targets for Thin Film Applications
参考页数：2P.;A4
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微电子设备用耐熔硅化物溅射电极的标准规范
Standard Specification for Refractory Silicide Sputtering Targets for Microelectronic Applications
参考页数：3P.;A4
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非蒸散型吸气剂激活全过程的气氛分析方法
Method of analysis for overall activation process of non-evaporable getrters (catmasphere method)
参考页数：7P.;A4
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电子管电性能的测试 第25部分：盖缪计数管的测试方法
Measurement of electrical properties of electronic tubes Part 25 Methods of measurement for Geiger-Muller counter tubes
参考页数：
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电子管内各电极的编号和单元的命名
Numbering of electrodes and designation of units in electronic tubes
参考页数：
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电子管电离辐射的测量
Measurements of ionizing radiation from electronic tubes
参考页数：
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DP-9型512×256线交流等离子体显示器件详细规范
Detail specification for type DP-9 512×256 line a.c.plasma display devices
参考页数：11P.;A4
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R408A型过电压保护气体放电管详细规范
Detail specification for gas discharge tube for overvoltage protection of type R408A
参考页数：11P.;A4
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